ZESTRON to Showcase HYDRON WS 325 at the Capital (DC) SMTA Expo & Tech Forum
Aug 17, 2012
ZESTRON will showcase HYDRON WS 325 at its regional chapter event, the Capital (DC) SMTA Expo & Tech Forum, in Laurel, Maryland on August 23rd from 9:00 a.m. to 3:00 p.m. The expo is located at Johns Hopkins University/Applied Physics Lab, 11100 Johns Hopkins Road.
Ask our team about ZESTRON's latest innovative solution for your water soluble
defluxing needs. With the unsurpassed cleaning performance of FAST Technology, HYDRON WS 325 has been specifically developed for cleaning water soluble flux residues in spray-in-air inline and batch cleaning applications. Applied at 3% to 5% concentration, HYDRON WS 325 penetrates the capillary spaces underneath low standoff components where DI-water only applications can no longer provide reliable cleanliness levels.
For more information about ZESTRON's extensive product lines, cleaning process solutions and services as well as our free of charge 2012 Ten Part Cleaning Webinar Series featured through ZESTRON @cademy, please visit our tabletop exhibit. Our sales and engineering team stands ready to answer any questions you may have.