ZESTRON's new FAST cleaning technology
Mar 22, 2007
ZESTRON America is pleased to introduce its newly developed FAST (Fast Acting Surfactant Technology) Technology. FAST Technology based cleaning agents are a proprietary mix of newly developed surfactants, which allows for a quicker removal of a wide variety of the latest lead-free and eutectic flux residues. When compared to traditional surfactant-based cleaning agents, this new technology provides much shorter contact times and requires a reduced amount of active ingredients for the complete removal of contaminants from substrate surfaces. FAST Technology's solid-free formula leaves no residues either on the substrates surface or within the equipment. FAST Technology cleaning agents such as the ATRON AC 205 can be used as a drop-in replacement for high and medium pressure, inline and batch cleaning systems. Furthermore, FASTTM Technology cleaning agents are guaranteed to meet the highest cleaning requirements such as the IPC 610, the J-STD 001 as well as the IPC-TM 650. In-depth and detailed free-of-charge cleaning experiments using FAST Technology cleaning agents can be completed in ZESTRON America's Application Technology Center featured with a variety of cleaning processes including inline, batch and ultrasonic cleaning. www.zestron.com
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